HiPIMS Puls power supplies MAGPULS HPP

HIPIMS PULSE POWER SUPPLIES MODEL MAGPULS HPP

 

Thanks to the short extremely high peak current pulses the pulse power supplies model MAGPULS HPP generate plasma intensity with highest density which leads to an excellent coating quality in high-pulse sputtering (HIPIMS).

 

Excellent film properties in terms of wear resistance, adhesive strength, hardness and homogeneity

Easy integration in existing magnetron sputter systems

APPLICATIONS

FEATURES AND BENEFITS

PRODUCT OVERVIEW

APPLICATIONS:

 

Novel PVD HIPIMS sputtering to produce hard coatings with very good wear and corrosion properties. Pulse power up to 12MW generates an extremely high ionization density without droplets. Further applications are in the plasma-treatment of surface and trench-filling and etching.

 

FEATURES AND BENEFITS:

 

Active ARC-suppression -> Prevention of drop formation in superior surface finish

 

Peak current limit -> Easy adaptation to different Process conditions to avoid overheating of the substrate or magnetron

 

Pulse power up to 12MW -> Excellent flexibility for different HPIMS processes in R&D and industry

 

Pulse -and Pulse pause time -> Optimum process stability and layer control

MODEL MAX. PULS-POWER PULS-CURRENT VOLTAGE FREQUENCY PULSTIME
MP2-HC 200 10kW DC 0–200A 0–1000V 100kHz 5µs–300µs
MP2-HC 400 20kW DC 0–4000A 0–1000V 50kHz 5µs–300µs
MP2-HC 600 30kW DC 0–600A 0–1000V 50kHz 5µs–300µs
MP2-HC 1000 60kW DC 0–1000A 0–1000V 50kHz 5µs–300µs
MP2-HC 1500 90kW DC 0–1500A 0–1000V 50kHz 5µs–300µs
MAGPULS

Stromversogungen

Chief executive:

Dipl. Ing. Dieter Schorn

Im Unterfeld 19

D-76547 Sinzheim

E-Mail.:

info@magpuls.net

Tel.:

+49 (0)7221 987 850

Fax.:

+49 (0)7221 987 454

© Magpuls Stromversorgungs Systeme GmbH