HIPIMS PULSE POWER SUPPLIES MODEL MAGPULS HPP
Thanks to the short extremely high peak current pulses the pulse power supplies model MAGPULS HPP generate plasma intensity with highest density which leads to an excellent coating quality in high-pulse sputtering (HIPIMS).
Excellent film properties in terms of wear resistance, adhesive strength, hardness and homogeneity
Easy integration in existing magnetron sputter systems
APPLICATIONS
FEATURES AND BENEFITS
PRODUCT OVERVIEW
APPLICATIONS:
Novel PVD HIPIMS sputtering to produce hard coatings with very good wear and corrosion properties. Pulse power up to 12MW generates an extremely high ionization density without droplets. Further applications are in the plasma-treatment of surface and trench-filling and etching.
FEATURES AND BENEFITS:
Active ARC-suppression -> Prevention of drop formation in superior surface finish
Peak current limit -> Easy adaptation to different Process conditions to avoid overheating of the substrate or magnetron
Pulse power up to 12MW -> Excellent flexibility for different HPIMS processes in R&D and industry
Pulse -and Pulse pause time -> Optimum process stability and layer control
MODEL | MAX. PULS-POWER | PULS-CURRENT | VOLTAGE | FREQUENCY | PULSTIME |
---|---|---|---|---|---|
MP2-HC 200 | 10kW DC | 0–200A | 0–1000V | 100kHz | 5µs–300µs |
MP2-HC 400 | 20kW DC | 0–4000A | 0–1000V | 50kHz | 5µs–300µs |
MP2-HC 600 | 30kW DC | 0–600A | 0–1000V | 50kHz | 5µs–300µs |
MP2-HC 1000 | 60kW DC | 0–1000A | 0–1000V | 50kHz | 5µs–300µs |
MP2-HC 1500 | 90kW DC | 0–1500A | 0–1000V | 50kHz | 5µs–300µs |
Stromversogungen
Chief executive:
Dipl. Ing. Dieter Schorn
Im Unterfeld 19
D-76547 Sinzheim
E-Mail.:
info@magpuls.net
Tel.:
+49 (0)7221 987 850
Fax.:
+49 (0)7221 987 454
© Magpuls Stromversorgungs Systeme GmbH