HiPIMS Puls power supplies MAGPULS HPP
HIPIMS PULSE POWER SUPPLIES MODEL MAGPULS HPP
Thanks to the short extremely high peak current pulses the pulse power supplies model MAGPULS HPP generate plasma intensity with highest density which leads to an excellent coating quality in high-pulse sputtering (HIPIMS).
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Excellent film properties in terms of wear resistance, adhesive strength, hardness and homogeneity
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Easy integration in existing magnetron sputter systems
APPLICATIONS
Novel PVD HIPIMS sputtering to produce hard coatings with very good wear and corrosion properties. Pulse power up to 12MW generates an extremely high ionization density without droplets. Further applications are in the plasma-treatment of surface and trench-filling and etching.
FEATURES AND BENEFITS
PRODUCT OVERVIEW
MP2-HC-200
MP2-HC-400
MP2-HC-750
MP2-HC-1000
MP2-HC-1500
